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Solution Manual for Fundamentals of Semiconductor Fabrication, Gary S. May, Simon M. Sze,,
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Table of Contents
Chapter 1. Introduction. [There is NO solution manual for ch1]
Chapter 2. Crystal Growth.
Chapter 3. Silicon Oxidation.
Chapter 4. Photolithography.
Chapter 5. Etching.
Chapter 6. Diffusion.
Chapter 7. Ion Implantation.
Chapter 8. Film Deposition.
Chapter 9. Process Integration.
Chapter 10. IC Manufacturing.
Chapter 11. Future Trends and Challenges.
Appendix A: List of Symbols.
Appendix B: International System of Units (SI Units).
Appendix C: Unit Prefixes.
Appendix D: Greek Alphabet.
Appendix E: Physical Constants.
Appendix F: Properties of Si and GaAs at 300 K.
Appendix G: Some Properties of the Error Function.
Appendix H: Basic Kinetic Theory of Gases.
Appendix I: SUPREM Commands.
Appendix J: Running PROLITH.
Appendix K. Percentage Points of the t Distribution.
Appendix L: Percentage Points of the F Distribution.
Index.
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